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Segregation of Impurities in GaAs and InAs Nanowires

Identifieur interne : 000571 ( Main/Repository ); précédent : 000570; suivant : 000572

Segregation of Impurities in GaAs and InAs Nanowires

Auteurs : RBID : Pascal:13-0365931

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English descriptors

Abstract

Using ab initio methods based on density functional theory, we investigate the segregation and formation energies for various dopants (Si, Be, Zn, and Sn) commonly used to obtain p- or n-type conductivity in GaAs and InAs nanowires. The distribution of Au and O atoms, which may be unintentionally incorporated during the wire growth, is also studied. The calculations performed for nanowires of zinc blende and wurtzite structure show that the distribution of most of the impurities depends on the crystal structure of the wires. For example, it is shown that the same growth conditions can lead to lower energy for Si substituting Ga (donor) in the wire of wurtzite structure and substituting As (acceptor) in the wire of zinc blende structure. In contrast, we obtain that gold and oxygen atoms should always tend to stay at the lateral surfaces of GaAs and InAs nanowires, whereas for beryllium the lowest energies are found when the impurities are located in sites in the center of the wurtzite wire or along the [101] axis from the surface to the center of the zinc blende wire. These results seem to be in agreement with some experimental findings.

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Le document en format XML

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<title xml:lang="en" level="a">Segregation of Impurities in GaAs and InAs Nanowires</title>
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<term>Blende structure</term>
<term>Crystal structure</term>
<term>Density functional method</term>
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<term>Doping</term>
<term>Gallium arsenides</term>
<term>Gold</term>
<term>Growth mechanism</term>
<term>Heat of formation</term>
<term>III-V compound</term>
<term>III-V semiconductors</term>
<term>Impurities</term>
<term>Impurity segregation</term>
<term>Indium arsenides</term>
<term>N type conductivity</term>
<term>Nanostructured materials</term>
<term>Nanowires</term>
<term>Operating conditions</term>
<term>Theoretical study</term>
<term>Wires</term>
<term>Wurtzite structure</term>
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<term>Ségrégation impureté</term>
<term>Arséniure de gallium</term>
<term>Semiconducteur III-V</term>
<term>Composé III-V</term>
<term>Arséniure d'indium</term>
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<term>Nanomatériau</term>
<term>Calcul ab initio</term>
<term>Méthode ab initio</term>
<term>Méthode fonctionnelle densité</term>
<term>Etude théorique</term>
<term>Chaleur formation</term>
<term>Dopage</term>
<term>Conductivité type n</term>
<term>Fil</term>
<term>Structure blende</term>
<term>Mécanisme croissance</term>
<term>Structure wurtzite</term>
<term>Impureté</term>
<term>Structure cristalline</term>
<term>Condition opératoire</term>
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<term>Centre accepteur</term>
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<div type="abstract" xml:lang="en">Using ab initio methods based on density functional theory, we investigate the segregation and formation energies for various dopants (Si, Be, Zn, and Sn) commonly used to obtain p- or n-type conductivity in GaAs and InAs nanowires. The distribution of Au and O atoms, which may be unintentionally incorporated during the wire growth, is also studied. The calculations performed for nanowires of zinc blende and wurtzite structure show that the distribution of most of the impurities depends on the crystal structure of the wires. For example, it is shown that the same growth conditions can lead to lower energy for Si substituting Ga (donor) in the wire of wurtzite structure and substituting As (acceptor) in the wire of zinc blende structure. In contrast, we obtain that gold and oxygen atoms should always tend to stay at the lateral surfaces of GaAs and InAs nanowires, whereas for beryllium the lowest energies are found when the impurities are located in sites in the center of the wurtzite wire or along the [101] axis from the surface to the center of the zinc blende wire. These results seem to be in agreement with some experimental findings.</div>
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<s0>Using ab initio methods based on density functional theory, we investigate the segregation and formation energies for various dopants (Si, Be, Zn, and Sn) commonly used to obtain p- or n-type conductivity in GaAs and InAs nanowires. The distribution of Au and O atoms, which may be unintentionally incorporated during the wire growth, is also studied. The calculations performed for nanowires of zinc blende and wurtzite structure show that the distribution of most of the impurities depends on the crystal structure of the wires. For example, it is shown that the same growth conditions can lead to lower energy for Si substituting Ga (donor) in the wire of wurtzite structure and substituting As (acceptor) in the wire of zinc blende structure. In contrast, we obtain that gold and oxygen atoms should always tend to stay at the lateral surfaces of GaAs and InAs nanowires, whereas for beryllium the lowest energies are found when the impurities are located in sites in the center of the wurtzite wire or along the [101] axis from the surface to the center of the zinc blende wire. These results seem to be in agreement with some experimental findings.</s0>
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<s5>15</s5>
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<s5>16</s5>
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<s0>Blende structure</s0>
<s5>16</s5>
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<s5>16</s5>
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<s5>29</s5>
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<s5>32</s5>
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<s5>32</s5>
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<s5>33</s5>
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<s5>72</s5>
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